Publications
Methods of forming stressed channel regions for a FinFET semiconductor device and the resulting device
Abstract
METHODS OF FORMING STRESSED CHANNEL REGIONS FOR A FINFET SEMCONDUCTOR DEVICE AND THE RESULTING DEVICE
Metadata
- publication
- US Patent 9,214,553, 2015
- year
- 2015
- publication date
- 2015/12/15
- authors
- X Cai, R Xie, AP Jacob, WP Maszara, K Cheng, A Khakifirooz
- link
- https://patents.google.com/patent/US9214553B2/en
- resource_link
- https://patentimages.storage.googleapis.com/11/63/2f/f99f75b0b51d62/US9214553.pdf
- inventors
- Xiuyu Cai, Ruilong Xie, Ajey P Jacob, Witold P Maszara, Kangguo Cheng, Ali Khakifirooz
- patent_office
- US
- patent_number
- 9214553
- application_number
- 14200952