Publications

Methods of forming stressed channel regions for a FinFET semiconductor device and the resulting device

Abstract

METHODS OF FORMING STRESSED CHANNEL REGIONS FOR A FINFET SEMCONDUCTOR DEVICE AND THE RESULTING DEVICE

Metadata

publication
US Patent 9,214,553, 2015
year
2015
publication date
2015/12/15
authors
X Cai, R Xie, AP Jacob, WP Maszara, K Cheng, A Khakifirooz
link
https://patents.google.com/patent/US9214553B2/en
resource_link
https://patentimages.storage.googleapis.com/11/63/2f/f99f75b0b51d62/US9214553.pdf
inventors
Xiuyu Cai, Ruilong Xie, Ajey P Jacob, Witold P Maszara, Kangguo Cheng, Ali Khakifirooz
patent_office
US
patent_number
9214553
application_number
14200952